Small PVD Magnetron Sputtering Coater Machine
A high negative voltage is applied to the sputtering sources, which contain the coating material. The resulting electrical gas discharge leads to the formation of positive argon ions, which are accelerated towards, and atomize the coating material. Evaporated, atomised metal in the gaseous phase then reacts with a gas containing the non-metallic component of the hard coating.
Magnetron Sputtering Machine for Commercial Applications is a production-oriented physical vapor deposition (PVD) system designed for high-quality thin film coating on a variety of substrates. Using advanced planar or rotatable magnetron cathodes, this machine deposits metals, alloys, oxides, and nitrides onto glass, metals, plastics, ceramics, and other materials. It is widely used for architectural glass coating, decorative finishes, automotive parts, electronics, and functional films. With modular chamber design, fast cycle times, and fully automated control, this sputtering machine delivers excellent coating uniformity (plus or minus 3 percent) and high throughput for commercial production environments.
| Item | Details |
|---|---|
| Model Number | SP-1000 / SP-1200 / SP-1400 / SP-1800 |
| Vacuum Chamber | Carbon steel / SUS304 |
| Sputtering Cathodes | ≥1 sets, DC / MF system |
| Pumping System | Turbo molecular or diffusion pump + mechanical pump |
| Ultimate Vacuum | 5.0*10-4 Pa |
| Working Mode | Automatic or Manual via PLC touchscreen |